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precision magnetic manipulator
LOADLOCKS & TRANSFER SYSTEMS CUSTOM SYSTEMS MAGNETIC TRANSPORTERS
precision magnetic manipulator
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MASCOT Loadlock and Transfer Systems
Wafer and Substrate Introduction Loadlock and Transfer Systems
This high-vacuum compatible, single-substrate loadlock system is designed to manually load wafers or other flat substrates into a SEMI-standard or custom process chamber. The MASCOT can mimic the motions of a complex and costly robot but is con-venient to use and significantly less costly.

Typically the MASCOT Loadlock would be mounted to a gate valve attached to a main system chamber. A substrate can then be easily positioned through the large entry door onto the transfer stage in the loadlock chamber. After the loadlock is evacuated to the desired vacuum level, and the gate valve opened, the substrate is transferred into the process chamber by gliding the magnet carriage along the outer tube. This allows repeated substrate loading and unloading without breaking vacuum in the main chamber greatly reducing process time.

Chambers are available for wafers or substrates up to 200mm or 300mm. Optional items include vertical lift capability, heavy-duty cart for portability and limit switches. Chambers can be modified or customized for non-standard applications.

A Precision Magnetic Manipulator (PMM) is used as the transfer device on the MASCOT Loadlock system. See PMM descrip-tion for complete specifications on these manipulators. A MASCOT-LO, with a linear-only PMM will precisely transfer a substrate into a process chamber where the receiving station has vertical lift capability to remove the substrate from a carrier on the end of the PMM. The MASCOT-LR uses a linear-rotary PMM where the rotation is actually used to operate a dynamic end effector with vertical motion capability to lift or lower a substrate during transfer. The PMM with a dynamic end effector can deliver a substrate to the process chamber and lower to set the substrate onto the receiving stage for processing. The PMM returns to lift the substrate and withdraw it into the loadlock chamber for removal after processing is complete.

Applications include process development, as a manufacturing tool or for low-volume production.
SPECIFICATIONS AND DESCRIPTION
MODEL MASCOT 200 MASCOT 300
Material
Chamber Single machined aluminum block
HV compatible
Metal with Viton O-rings
Single machined aluminum block
HV compatible
Metal with Viton O-rings
Transfer System All HV Compatible All HV Compatible
Description
Substrate sizes Up to 200mm Up to 300mm
Exterior dimension 14" x 11.5" x 4" 18.70" x 14.75" x 4"
Load door w/window 10" load door 14" load door
MESC-standard interface SEMI E21-91 SEMI E21
Chamber volume with typical PMM installed 3.89 Liters 7.51 Liters
Pump port ISO NW100 ISO NW100
Auxiliary ports Three ISO NW40 Three ISO NW40
Weight ~ 45 pounds (with PMM) ~ 60 pounds (with PMM)
Performance
Transfer distance Up to 60 inches Up to 60 inches
Dynamic End Effector vertical travel Standard = 0.276" total Standard = 0.5" total
Specifications subject to change without notice.
MASCOT 200 LoadLock

DIAGRAM OF TYPICAL 200mm MASCOT LOADLOCK SYSTEM
MASCOT 200 System Drawing
MASCOT 300 LoadLock

DIAGRAM OF TYPICAL 300mm MASCOT LOADLOCK SYSTEM
MASCOT 300 System Drawing
Dual MASCOT CUSTOM MASCOT SYSTEMS

Customized MASCOT chambers can accommodate substrates in a wide range of shapes and sizes. The MASCOT valve interface can be modified to mate to a variety of vacuum systems. Download a PDF file of the MASCOT Datasheet here and view other custom systems.

Dual MASCOT System shown can introduce a sample to two different chambers without bringing the sample back to atmosphere.
precision magnetic manipulator
 
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